At room temperature under nitrogen trifluoride is a colorless, odorless, stable gas.It is a strong oxidant. Nitrogen trifluoride in the microelectronics industry is used as a good plasma etching gas, the reactive ion etching cleavage of fluoride ion, these ions on silicon and tungsten fluorine compounds, high purity nitrogen trifluoride has excellent etch rate and selection sex (for silicon oxide and silicon).It is etching, the etched surface without leaving any residue, It is a very good cleaning agent, while in chip manufacturing, high-energy lasers has received a lot of use.